Dutch equipment supplier SALD has announced delivery of a spatial atomic layer deposition system to an unnamed customer in the United States. The tool will be used in the pilot-scale production of ...
SkyWater Technology announced on September 7 that it will offer customers a new semiconductor processing tool for atomic layer deposition (ALD), the Applied Picosun MorpherTM. Many devices, such as ...
A technical paper titled “Quantified Uniformity and Selectivity of TiO 2 Films in 45-nm Half Pitch Patterns Using Area-Selective Deposition Supercycles” was published by researchers at IMEC, North ...
Abstract Light-driven quantum tunneling offers an attractive platform for coherent electron control at ultrafast time scales; however, sustainable ...
Atomic layer deposition (ALD) used to be considered too slow to be of practical use in semiconductor manufacturing, but it has emerged as a critical tool for both transistor and interconnect ...
Atomic layer deposition (ALD) originated from atomic layer epitaxy, which was introduced in 1970 and initially used in electroluminescent displays. It rapidly revolutionized semiconducting ...
insights from industryDr. Paul Poodt & Alexander BoumanCTO/Founder & Commercial DirectorSparkNano In this interview, AZoMaterials speaks with Dr. Paul Poodt, CTO, and Alexander Bouman, Business ...
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